JPH048945B2 - - Google Patents

Info

Publication number
JPH048945B2
JPH048945B2 JP57089931A JP8993182A JPH048945B2 JP H048945 B2 JPH048945 B2 JP H048945B2 JP 57089931 A JP57089931 A JP 57089931A JP 8993182 A JP8993182 A JP 8993182A JP H048945 B2 JPH048945 B2 JP H048945B2
Authority
JP
Japan
Prior art keywords
jig
housing
wafer
storage
static electricity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57089931A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58207651A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8993182A priority Critical patent/JPS58207651A/ja
Publication of JPS58207651A publication Critical patent/JPS58207651A/ja
Publication of JPH048945B2 publication Critical patent/JPH048945B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67326—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls
    • H01L21/6733—Horizontal carrier comprising wall type elements whereby the substrates are vertically supported, e.g. comprising sidewalls characterized by a material, a roughness, a coating or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP8993182A 1982-05-28 1982-05-28 静電防止型収容治具 Granted JPS58207651A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8993182A JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Publications (2)

Publication Number Publication Date
JPS58207651A JPS58207651A (ja) 1983-12-03
JPH048945B2 true JPH048945B2 (en]) 1992-02-18

Family

ID=13984436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8993182A Granted JPS58207651A (ja) 1982-05-28 1982-05-28 静電防止型収容治具

Country Status (1)

Country Link
JP (1) JPS58207651A (en])

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6063941U (ja) * 1983-10-07 1985-05-07 信越化学工業株式会社 電子材料用ウエ−ハハンドリング用治具類
JPH0638413B2 (ja) * 1984-01-12 1994-05-18 三井東圧化学株式会社 ウェハ処理用容器
JPS6112099A (ja) * 1984-06-26 1986-01-20 倉敷紡績株式会社 半導体製造用治具
JPS6137842A (ja) * 1984-07-30 1986-02-22 Daikin Ind Ltd 非帯電性高分子材料
JPS6456866U (en]) * 1987-09-30 1989-04-10
JPH0260954A (ja) * 1988-08-29 1990-03-01 Daikin Ind Ltd 非帯電性高分子材料
JPH02201926A (ja) * 1989-01-31 1990-08-10 Fujitsu Ltd ウエット洗浄用ホルダ及びウエット洗浄方法
JPH0312949A (ja) * 1989-06-12 1991-01-21 Fujitsu Ltd ウエハキャリア保持装置
JPH0380535A (ja) * 1989-08-23 1991-04-05 Fujitsu Ltd 洗浄ホルダ
TWI276194B (en) * 2001-12-03 2007-03-11 Du Pont Transfer member with electric conductivity and its manufacturing method
CN1978074B (zh) * 2005-12-02 2010-11-10 鸿富锦精密工业（深圳）有限公司 镜片清洗治具
JP7090482B2 (ja) * 2018-06-18 2022-06-24 株式会社Ｓｃｒｅｅｎホールディングス チャック部材及び基板処理装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108880A (en]) * 1974-02-01 1975-08-27
JPS53114670A (en) * 1977-03-17 1978-10-06 Toshiba Ceramics Co Jig for diffusion furnace

Also Published As

Publication number Publication date
JPS58207651A (ja) 1983-12-03

Similar Documents

Publication Publication Date Title
JPH048945B2 (en])
US5780127A (en) Wafer carrier
JPH0451433B2 (en])
TW201937010A (zh) 電鍍裝置
JP2017077528A (ja) フォトマスク関連基板に用いる基板洗浄装置及び基板洗浄方法
US4908665A (en) Developer carrier containing electrically conductive filler present in a resin coating layer for use in dry-type image developing device
JPS6137842A (ja) 非帯電性高分子材料
US10954603B2 (en) Substrate holder, plating apparatus, plating method, and electric contact
JP4899593B2 (ja) 電子部品包装用カバーテープ
JP2664582B2 (ja) 樹脂フィルム製造用のロール
US2492429A (en) Electric translating device
JP2012030897A (ja) 電子部品包装用カバーテープ
JP3476950B2 (ja) 遠心乾燥機
JPH0839441A (ja) 部品把持具
US2634305A (en) Deferred-action battery
JPS6333778B2 (en])
JP2004136625A (ja) 帯電防止用シート及び粘着テープ
JP2021118276A (ja) 基板処理装置
JPH0633613Y2 (ja) コロナ放電器
JPH0312949A (ja) ウエハキャリア保持装置
JP2004041977A (ja) 半導体製造装置用粘着シート及び異物除去方法
US1455428A (en) Motion-picture film
JP2702438B2 (ja) 半導体ウェハの回転乾燥装置
JPS61247738A (ja) プラスチツク軸受
JPH0817164B2 (ja) 半導体装置の製造装置